As a long-standing equipment supplier, Vistec Electron Beam GmbH, Jena (Germany) is providing leading technology solutions for advanced electron-beam lithography (EBL). Based on the Variable Shaped Beam (VSB) principle, the lithography systems are mainly utilized for semiconductor manufacturing and advanced research as electron-beam direct write in semiconductor industry, mask making as well as integrated optics, photonics and several new emerging markets.

In addition to its production facility in Germany, Vistec Electron Beam maintains service and support centers in Europe, Asia Pacific and the US.