World-leader in Nanoscale Metrology Solutions

 Park Systems is the global leader in atomic force microscopy (AFM), delivering high-precision metrology and failure analysis solutions for semiconductor fabrication and device R&D. Our industrial AFM platforms — including the fully automated, SEMI-compliant Park NX-Wafer — support in-line 3D nano-metrology, CMP planarity, high-aspect-ratio trench and Cu pad measurement, and automatic defect review (ADR), integrating seamlessly into fab environments via SECS/GEM. True Non-Contact™ imaging preserves tip life for repeatable, non-destructive results. For failure analysis, our systems add electrical characterization (SCM, SSRM) to nanoscale topographic and mechanical imaging. Trusted by leading semiconductor manufacturers worldwide. Visit http://www.parksystems.com for more information.