Advancing the Standard

Based in Munich, Germany, with subsidiaries in Tokyo and San Francisco, GenISys develops high-performance software solutions for micro- and nano-fabrication. The company serves the lithography and inspection markets, combining expertise in layout data processing, process modeling, correction and optimization with world-class software engineering. Its solutions support IC prototyping, mask production, DfM development and MEMS. For electron- and laser-beam direct writing and mask manufacturing, GenISys software enables advanced data preparation and proximity effect correction. Founded in 2005, GenISys is a global market leader in electron-beam lithography software and continues to expand into related markets and applications.