As a long-standing equipment supplier, Vistec Electron Beam GmbH, Jena (Germany) is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for semiconductor and advanced research applications, such as electron-beam direct write in semiconductor manufacturing, including compound semiconductor, direct write mask making as well as photonics and several new emerging markets.

In addition to its production facility in Germany, Vistec Electron Beam maintains service and support centers in Europe, Asia Pacific and the US.