Park Systems provides advanced nanoscale AFM Metrology tools for Hard Disk Market, Semiconductor and Wafer-Fab Manufacturing. Recently launched Park NX-Hybrid WLI is the first fully integrated system that combines Atomic Force Microscope (AFM) with White Light Interferometer (WLI) profilometry. NX-Hybrid WLI is dedicated for semiconductor and related manufacturing quality assurance, process control for semiconductor front-end, back-end up to advanced packaging, and R&D metrology.
The industrial automated AFM product line from Park Systems offers the leading nano metrology solutions for 3D surface characterization, failure analysis and large sample research. AFM tools from Park Systems are trusted to deliver ultra-high resolution, unparalleled reproducibility, and extremely precise measurements quickly and easily.